SKU:37686291710
SrTiO3 (100)+/-0.1 deg 10x10x0.5 mm Epi polished wafer 1 SP, - STOa101005S1deg01
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USA
- USA
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- USA
- CAN
Ships within 48 hours · Estimated delivery Jul 12 - Jul 17
Description
SrTiO3 (100)+/-0.1 deg 10x10x0.5 mm Epi polished wafer 1 SP, - STOa101005S1deg01SrTiO3 single crystal provides a good lattice match to most materials with Perovskite structure. It is an excellent substrate for epitaxial growth of HTS and many oxide thin films. SrTiO3 single crystal has also been used widely for special optical windows and as high quality sputtering target. MTI has the full production line to manufacture first the high purity SrTiO3 powder, then the single crystal boules and finally the epi polished substrates in
0185" thickness
Hydraulic Pressure in Chamber 300 Mpa ( 43500 PSI) Hydraulic Machine optional
Other Metallic Foams A-Z
Meter Type Variable Area Scale 2" Scale Valve Stainless Steel Valve Temperature Limit 103 F Pressure Limit 100 PSI (Caution: Please alway control the pressure of air intake less than 100 psi) Connection Size 8th inch Accuracy 4% Low Range Cubic Centimeters per Minute 500 CCM High Range Cubic Centimeters per Minute 5000 CCM Please click the picture for the details of flow meter
Carbon (synthetic) powder
Height of Tape Area: 4
Nc=1E15-1E16/cc
Hexoloy SG Silicon Carbide Ceramic Substrate
Continuous current: 40A Max
SYJ-160 is CE certified low-speed diamond saw
It is really difficult to avoid the oxidation of the nickel
Gauge Displayed Pressure Value (Bar) for 87 mm Dia
Quick Dispatch:
Your SrTiO3 (100)+/-0.1 deg 10x10x0.5 mm Epi polished wafer 1 SP, - STOa101005S1deg01 orders ship within 1-2 business days.
Delivery Options:
- Standard: 3-7 business days
- Fast: 2-3 business days
- Express: 1-2 business days
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Exchange/Return Notes
- We offer a 30-day return/exchange service after receiving.
- Final sale items are not eligible for returns or exchanges.
- To process your return/exchange, please contact us at [email protected]
- Please click here for more details>>> Return & Exchange Policy