SKU:7936665541
Nickel <111> Film( 100nm) Coated Si Wafer (100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cm
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Ships within 48 hours · Estimated delivery Jul 12 - Jul 17
Description
Nickel <111> Film( 100nm) Coated Si Wafer (100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cmNickel Metallic Film Film Speification Nickel Film Thickness: 100nm Film Crystallinity: (111) oriented polycrystals Silicon Wafer Specifications: Conductive type: Si P type, B doped Resistivity: 1 20 ohm cm Size: 10x10x0. 5mm Orientation: (100) + 0. 5o Polish: One sides polished Surface roughness: Prime Packing: Vacuum packed Optional: you may need tool below to handle the wafer ( click picture to order ) Related Products Thin Films A Z Crystal wafer
Solvents and chemicals used for electrospinning may be poisonous
dicing and slicing all kinds of materials especially for brittle crystals
Composition: (Y2O3)0
If this helps
Cutting / Dicing Saws
Specifications Materials Case and cap are made of Nickel plated A3 steel
Pressing sample by a pressing machine under suitable pressure
Growth method LEC
Related Data
5mm 6x3mm blue FR-PPR tube(Crimper gas outlet)
It does not usually affect the major performances
1o off to A-plane
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